Silicon for plasma spraying

Elkem has been producing industrial volumes of high purity silicon for plasma spraying processes since 2007. Plasma spraying are used both for production of sputtering targets and direct surface coating. Our silicon is produced with both a well-defined bottom cut and top cut to give maximum yield in the plasma spraying process.

Applications of silicon in plasma spraying

  • Silicon for sputtering targets
  • Silicon for direct surface coating

Silicon for sputtering targets

Our Silgrain® PreSize qualities are tailor made for production of sputtering targets. Sputtering targets are used in a sputtering process for deposition of a thin film on a substrate, such as coating of glass.

Silicon for direct surface coating

Plasma spraying can be used for direct surface coating on all kinds of components, such as semiconductor equipment, gas turbines, ceramic industry etc.

Silgrain® PreSize

Silgrain® PreSize is a silicon powder developed to give maximum yield in the thermal spraying process for the production of sputtering targets used in the glass industry. The particle size distributions of our Silgrain® PreSize products are produced with both a well-defined bottom cut and top cut.

Silgrain® Supreme PreSize

Silgrain® Supreme PreSize is a silicon powder with both a well-defined bottom cut and top cut developed for thermal spraying processes which require very high purity silicon powders - typically 99.99 % Si.